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1. Consider the following statements: The function of oxide layer in an IC device is to mask against diffusion or non implantinsulate the surface electricallyincrease the melting point of siliconproduce a chemically stable protective layer Of these statements:





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  • By: guest on 02 Jun 2017 12.52 am
    Oxide layer cannot have any effect on melting point of silicon. Moreover before melting silicon breaks down.
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